A text on the basic principles of various thin-film vapor-phase deposition techniques, covering fundamentals and evolving topics including oil-free vacuum, microstructure control, selective CVD, and microanalysis. Discusses selection of techniques for specific applications, and shows how to predict and optimize deposition process behavior and solve production problems, with chapter exercises, a list of symbols and acronyms, and use of SI units. For graduate students in materials science, engineering, and applied physics. Annotation c. by Book News, Inc., Portland, Or.